27 February 1989 In-Situ Optical Monitoring Of Thin Films During Evaporation
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Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950022
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
An optical monitoring system for the in-situ reflectivity measurement on the actual moving substrates during e-beam thin film batch deposition is described. The reflectivity of one of the substrates mounted on the caroussel and moving in a planetary motion during the deposition is measured at 2 laser wavelengths (HeNe green and red) and compared with computed curves to determine the end-points. Examples of deposited TiO2 films and a multi-layer dielectric mirror are given.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. T. Gale, M. T. Gale, H. W Lehmann, H. W Lehmann, H. Brunner, H. Brunner, K. Frick, K. Frick, } "In-Situ Optical Monitoring Of Thin Films During Evaporation", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950022; https://doi.org/10.1117/12.950022

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