Magnetron Sputtering Deposition Of Ultrathin W-Si Multilayers For X Rays Optics

B. Vidal; J. Marfaing; P. Dhez

doi:10.1117/12.950030

27 February 1989 Magnetron Sputtering Deposition Of Ultrathin W-Si Multilayers For X Rays Optics

B. Vidal, J. Marfaing, P. Dhez

Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950030
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

New magnetic materials and X Ray mirrors lead to prepare multilayered structures (M.L.S.) with the thinnest periodic layers. However physical limitations appear for periods below some tens of Å. In particular, tolerances of realization are critical relatively to ultrathin thicknesses values. In sputtering, the deposition rate is easily reproducible, and can be maintained at a constant and low value during severals hours; for these reasons we are able to perform a large number (more than one hundred) of periodic ultrathin layers by this system (3 to 1.5 nm). High Resolution Transmission Electron Microscopy (H.R.T.E.M.) and X Ray reflectivity measurements are used to compare interfaces and stacking regularities for sample with 140 layers. The W/Si M.L.S. present a best quality, as for interfaces and structures, compared to the W/C M.L.S.

Citation Download Citation

B. Vidal, J. Marfaing, and P. Dhez "Magnetron Sputtering Deposition Of Ultrathin W-Si Multilayers For X Rays Optics", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); https://doi.org/10.1117/12.950030

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