27 February 1989 The Use Of Molecular Beam Techniques For The Fabrication Of Optical Thin Films And Structures
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Proceedings Volume 1019, Thin Film Technologies III; (1989) https://doi.org/10.1117/12.950037
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Molecular Beam and Ultra-High Vacuum techniques have been applied to the deposition of optical thin films and structures. Materials studied include ZnSe, ZnS, BaF2 and PbF2. Properties of microstructure and crystallite size have been studied using cross sectional TEM techniques. MBE techniques enable the production of novel thin film structures such as Bragg reflectors and graded index anti-reflection coatings. Etalon filters fabricated using this method show consierably improved long term operating stability over those produced by conventional evaporation.
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I T Muirhead, K L Lewis, A M Pitt, A G Cullis, T J Wyatt-Davies, G Williams, A Miller, "The Use Of Molecular Beam Techniques For The Fabrication Of Optical Thin Films And Structures", Proc. SPIE 1019, Thin Film Technologies III, (27 February 1989); doi: 10.1117/12.950037; https://doi.org/10.1117/12.950037
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