Impedance Matching Of Rf-Excited CO[sub]2[/sub]-Lasers

Bruno Walter

doi:10.1117/12.950050

24 March 1989 Impedance Matching Of Rf-Excited CO₂-Lasers

Bruno Walter

Proceedings Volume 1020, High Power CO2 Laser Systems and Applications; (1989) https://doi.org/10.1117/12.950050
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

The rf-excitation technique bases on the application of a sinusoidal voltage in the regime above 10 MHz to obtain a glow discharge. Specific requirements are necessary to ensure an efficient and reflection free power transmission from the generator to the load. In case of power matching the maximum power transmission is obtained, whereas impedance matching avoids reflection of the incident rf-power which would cause a standing wave at the line. Two or three element lumped circuits are sufficient to match the impedance of an rf-plasma to the characteristic impedance of the transmission line. In our case the eight laser discharge sections were driven by their own generators, each connected by a 50 Ω transmission line and a Collins filter. This Collins filter ensures an ideal matching for the total range of input power so that the total incident rf-power is utilized in the plasma.

Citation Download Citation

Bruno Walter "Impedance Matching Of Rf-Excited CO₂-Lasers", Proc. SPIE 1020, High Power CO2 Laser Systems and Applications, (24 March 1989); https://doi.org/10.1117/12.950050

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