24 March 1989 Impedance Matching Of Rf-Excited CO2-Lasers
Author Affiliations +
Proceedings Volume 1020, High Power CO2 Laser Systems and Applications; (1989) https://doi.org/10.1117/12.950050
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
The rf-excitation technique bases on the application of a sinusoidal voltage in the regime above 10 MHz to obtain a glow discharge. Specific requirements are necessary to ensure an efficient and reflection free power transmission from the generator to the load. In case of power matching the maximum power transmission is obtained, whereas impedance matching avoids reflection of the incident rf-power which would cause a standing wave at the line. Two or three element lumped circuits are sufficient to match the impedance of an rf-plasma to the characteristic impedance of the transmission line. In our case the eight laser discharge sections were driven by their own generators, each connected by a 50 Ω transmission line and a Collins filter. This Collins filter ensures an ideal matching for the total range of input power so that the total incident rf-power is utilized in the plasma.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bruno Walter, "Impedance Matching Of Rf-Excited CO2-Lasers", Proc. SPIE 1020, High Power CO2 Laser Systems and Applications, (24 March 1989); doi: 10.1117/12.950050; https://doi.org/10.1117/12.950050
PROCEEDINGS
13 PAGES


SHARE
Back to Top