Paper
10 April 1989 Hydrogenated Amorphous Silicon Films Deposited By CO2 Laser Induced Decomposition Of Silane
P. Gonzalez, M. D. Fernandez, B. Leon, M. Perez-Amor
Author Affiliations +
Proceedings Volume 1022, Laser Assisted Processing; (1989) https://doi.org/10.1117/12.950108
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
First results obtained by laser-induced chemical vapour deposition of hydrogenated amorphous silicon films are reported. Processing conditions are determined for production of films suitable to be used in photovoltaic applications.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Gonzalez, M. D. Fernandez, B. Leon, and M. Perez-Amor "Hydrogenated Amorphous Silicon Films Deposited By CO2 Laser Induced Decomposition Of Silane", Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); https://doi.org/10.1117/12.950108
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Cited by 2 scholarly publications.
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KEYWORDS
Laser processing

Amorphous silicon

Silicon films

Carbon dioxide lasers

Infrared radiation

Photovoltaics

Argon

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