Kinetics Of Laser-Assisted Oxidation Of Metallic Films

P. Quenon; O. Toubeau; M. Wautelet

doi:10.1117/12.950116

10 April 1989 Kinetics Of Laser-Assisted Oxidation Of Metallic Films

P. Quenon, O. Toubeau, M. Wautelet

Proceedings Volume 1022, Laser Assisted Processing; (1989) https://doi.org/10.1117/12.950116
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany

Abstract

Oxidation of thin metallic films on glass substrates exposed to cw Ar+ laser irradiation is studied. The evolution of the oxide thickness, x, with time, t, is measured via the reflectivity of a probed He-Ne laser beam. Under certain conditions, the temperature of the irradiated zone is measured via the reflectivity of the glass substrate. Therefore, the x(t) and dx(T)/dt are deduced. This permits to obtain a much better kinetics of oxidation than for previous works, where oxidation rates were measured from the positions of the minima and maxima of reflectivity. Evidence for a temperature threshold for laser-assisted oxidation of vanadium film is obtained. This threshold is independent on laser fluence.

Citation Download Citation

P. Quenon, O. Toubeau, and M. Wautelet "Kinetics Of Laser-Assisted Oxidation Of Metallic Films", Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); https://doi.org/10.1117/12.950116

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