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10 April 1989 Pyrolytic Deposition Of SiO2 With CO2 Laser
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Proceedings Volume 1022, Laser Assisted Processing; (1989) https://doi.org/10.1117/12.950109
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Preliminary results obtained by laser-induced chemical vapor deposition of silicon dioxide films are reported. Films have been deposited on a silicon substrate using a CO2 laser.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. D. Fernandez, P. Gonzalez, B. Leon, and M. Perez-Amor "Pyrolytic Deposition Of SiO2 With CO2 Laser", Proc. SPIE 1022, Laser Assisted Processing, (10 April 1989); https://doi.org/10.1117/12.950109
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