Paper
30 December 2016 Features of local anodic oxidation process
A. Belov, Yu. Chaplygin, S. Lemeshko, I. Sagunova, V. Shevyakov
Author Affiliations +
Proceedings Volume 10224, International Conference on Micro- and Nano-Electronics 2016; 102241Q (2016) https://doi.org/10.1117/12.2264436
Event: The International Conference on Micro- and Nano-Electronics 2016, 2016, Zvenigorod, Russian Federation
Abstract
The article dwells upon theoretical considerations on the nature of probe local anodic oxidation. The concept of the process presented here allows for the device intrinsic amperage limitations in the tip-sample system. The work also demonstrates characteristics of height-modulated dielectric mask formation on the solid-state surfaces.
© (2016) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. Belov, Yu. Chaplygin, S. Lemeshko, I. Sagunova, and V. Shevyakov "Features of local anodic oxidation process", Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 102241Q (30 December 2016); https://doi.org/10.1117/12.2264436
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KEYWORDS
Oxidation

Photomasks

Oxides

Dielectrics

Conductive coatings

Modulation

Resistance

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