Plasma parameters and active species kinetics in CF4/O2/Ar gas mixture: effects of CF4/O2 and O2/Ar mixing ratios

Junmyung Lee; Kwang-Ho Kwon; A. Efremov

doi:10.1117/12.2266348

30 December 2016 Plasma parameters and active species kinetics in CF₄/O₂/Ar gas mixture: effects of CF₄/O₂ and O₂/Ar mixing ratios

Junmyung Lee, Kwang-Ho Kwon, A. Efremov

Author Affiliations +

Proceedings Volume 10224, International Conference on Micro- and Nano-Electronics 2016; 102241U (2016) https://doi.org/10.1117/12.2266348
Event: The International Conference on Micro- and Nano-Electronics 2016, 2016, Zvenigorod, Russian Federation

Abstract

The effects of both CF₄/O₂ and O₂/Ar mixing ratios in three-component CF₄/O₂/Ar mixture on plasma parameters, densities and fluxes of active species determining the dry etching kinetics were analyzed. The investigation combined plasma diagnostics by Langmuir probes and zero-dimensional plasma modeling. It was found that the substitution of CF₄ for O₂ at constant fraction of Ar in a feed gas produces the non-monotonic change in F atom density, as it was repeatedly reported for the binary CF₄/O₂ gas mixtures. At the same time, the substitution of Ar for O₂ at constant fraction of CF₄ results in the monotonic increase in F atom density toward more oxygenated plasmas. The natures of these phenomena as well as theirs possible impacts on the etching/polymerization kinetics were discussed in details.

Citation Download Citation

Junmyung Lee, Kwang-Ho Kwon, and A. Efremov "Plasma parameters and active species kinetics in CF₄/O₂/Ar gas mixture: effects of CF₄/O₂ and O₂/Ar mixing ratios", Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 102241U (30 December 2016); https://doi.org/10.1117/12.2266348

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