30 December 2016 Elements for hard X-ray optics produced by cryogenic plasma etching of silicon
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Proceedings Volume 10224, International Conference on Micro- and Nano-Electronics 2016; 1022421 (2016) https://doi.org/10.1117/12.2266471
Event: The International Conference on Micro- and Nano-Electronics 2016, 2016, Zvenigorod, Russian Federation
Abstract
A number of different hard X-ray optics elements such as refractive lenses, refractive bi-lenses and multilens interferometers, mirror interferometers can be made of Silicon. The optical performance of these elements depends on the quality of refracting and reflecting surfaces. Cryogenic deep anisotropic etching was proposed for fabrication of parabolic planar lenses and mirror interferometers. The investigation of sidewall roughness was done by AFM and by optical interferometry. Geometrical parameters of structures were measured by SEM. It was observed that roughness of inner sidewalls of etched structures does not exceed 3 nm/um (RMS) and deviation from vertical profile was within 30 nm along 20 um depth.
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Andrey V. Miakonkikh, Alexander E. Rogozhin, Konstantin V. Rudenko, Vladimir F. Lukichev, Vyacheslav A. Yunkin, Anatoly A. Snigirev, "Elements for hard X-ray optics produced by cryogenic plasma etching of silicon ", Proc. SPIE 10224, International Conference on Micro- and Nano-Electronics 2016, 1022421 (30 December 2016); doi: 10.1117/12.2266471; https://doi.org/10.1117/12.2266471
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