26 April 1989 Holographic Generation Of Gratings With Periodicities Below 150 nm With An Excimer Laser
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Proceedings Volume 1023, Excimer Lasers and Applications; (1989) https://doi.org/10.1117/12.950154
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
Holographic generation of gratings with periodicities down to 140nm in thin polymethyl methacrylate (PMMA) layers on Si-substrates using a narrow band KrF-excimer laser (λ=248 nm) is reported. At low single pulse energy densities (<3OmJ/cm2) the gratings are prepared by conventional photolithography. At higher single pulse energy densities (>70mJ/cm2) we directly write gratings in the PMMA by photoetching (ablation).
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T. Ahlhorn, H. Pohlmann, J. P. Kotthaus, "Holographic Generation Of Gratings With Periodicities Below 150 nm With An Excimer Laser", Proc. SPIE 1023, Excimer Lasers and Applications, (26 April 1989); doi: 10.1117/12.950154; https://doi.org/10.1117/12.950154
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