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26 April 1989 Overview Of Recent Advances In Excimer Laser Technology At Los Alamos
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Proceedings Volume 1023, Excimer Lasers and Applications; (1989) https://doi.org/10.1117/12.950124
Event: 1988 International Congress on Optical Science and Engineering, 1988, Hamburg, Germany
Abstract
From among the areas of excimer laser development at Los Alamos two are selected for further discussion: ultra-high brightness excimer laser systems and discharge-pumped XeF(C→A) lasers operating in the blue-green portion of the spectrum. Two different high brightness systems are described. One is based on small-aperture KrF amplifiers, while the other is based on a large-aperture XeC1 amplifier. The XeF(C→A) laser is tunable from 435 to 525 nm, and may one day become a viable alternative to pulsed dye lasers for many applications.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Irving J. Bigio, Robert C. Sze, Antoinette J. Taylor, and Robert F. Gibson "Overview Of Recent Advances In Excimer Laser Technology At Los Alamos", Proc. SPIE 1023, Excimer Lasers and Applications, (26 April 1989); https://doi.org/10.1117/12.950124
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