Development of depth-graded W/Si multilayer mirrors for x-ray focusing telescope application

Runze Qi; Qiushi Huang; Yang Yang; Zhong Zhang; Zhanshan Wang

doi:10.1117/12.2265752

31 May 2017 Development of depth-graded W/Si multilayer mirrors for x-ray focusing telescope application

Runze Qi, Qiushi Huang, Yang Yang, Zhong Zhang, Zhanshan Wang

Proceedings Volume 10235, EUV and X-ray Optics: Synergy between Laboratory and Space V; 102350G (2017) https://doi.org/10.1117/12.2265752
Event: SPIE Optics + Optoelectronics, 2017, Prague, Czech Republic

Abstract

X-ray Timing and Polarization (XTP) telescope is proposed in China, by using the nested Wolter-I type optical system with large effective area, for the study of high energy physics at the region of 1-30 keV. High reflectance and low stress W/Si multilayers are demanded in the telescope to fulfill the spectral response and ensure the figure quality of the mirrors at the same time. A dedicated cylindrical deposition facility based on direct current magnetron sputtering technique was developed. Using this facility, W/Si multilayers fabricated under different base pressure and working pressure were tested to optimize the sputtering process. The microstructure and stress of W/Si multilayers with different d-spacing (d=2.0 nm-7.0 nm) and thickness ratio of W (ϒ_w=0.3-0.7) were studied. In order to obtain low stress multilayer mirrors, post-deposition annealing was applied on the multilayers and both the effects of temperature and annealing time were studied. Based on these works, a depth-graded W/Si multilayer was deposited on thin cylindrical mirror and the X-ray reflectivity was measured at Beijing Synchrotron Radiation Facility (BSRF).

Conference Presentation

Citation Download Citation

Runze Qi, Qiushi Huang, Yang Yang, Zhong Zhang, and Zhanshan Wang "Development of depth-graded W/Si multilayer mirrors for x-ray focusing telescope application", Proc. SPIE 10235, EUV and X-ray Optics: Synergy between Laboratory and Space V, 102350G (31 May 2017); https://doi.org/10.1117/12.2265752

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