17 May 2017 XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets
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Abstract
Laser-produced plasmas are intense sources of XUV radiation that can be suitable for different applications such as extreme ultraviolet lithography, beyond extreme ultraviolet lithography and water window imaging. In particular, much work has focused on the use of tin plasmas for extreme ultraviolet lithography at 13.5 nm. We have investigated the spectral behavior of the laser produced plasmas formed on closely packed polystyrene microspheres and porous alumina targets covered by a thin tin layer in the spectral region from 2.5 to 16 nm. Nd:YAG lasers delivering pulses of 170 ps (Ekspla SL312P )and 7 ns (Continuum Surelite) duration were focused onto the nanostructured targets coated with tin. The intensity dependence of the recorded spectra was studied; the conversion efficiency (CE) of laser energy into the emission in the 13.5 nm spectral region was estimated. We have observed an increase in CE using high intensity 170 ps Nd:YAG laser pulses as compared with a 7 ns pulse.
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Ellie Floyd Barte, Ellie Floyd Barte, Ragava Lokasani, Ragava Lokasani, Jan Proska, Jan Proska, Lucie Stolcova, Lucie Stolcova, Oisin Maguire, Oisin Maguire, Domagoj Kos, Domagoj Kos, Paul Sheridan, Paul Sheridan, Fergal O’Reilly, Fergal O’Reilly, Emma Sokell, Emma Sokell, Tom McCormack, Tom McCormack, Gerry O’Sullivan, Gerry O’Sullivan, Padraig Dunne, Padraig Dunne, Jiri Limpouch, Jiri Limpouch, } "XUV generation from the interaction of pico- and nanosecond laser pulses with nanostructured targets", Proc. SPIE 10243, X-ray Lasers and Coherent X-ray Sources: Development and Applications, 1024315 (17 May 2017); doi: 10.1117/12.2265984; https://doi.org/10.1117/12.2265984
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