5 January 2017 Analysis method of microstructure surface topography based on wavelet filter
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Proceedings Volume 10244, International Conference on Optoelectronics and Microelectronics Technology and Application; 102441H (2017) https://doi.org/10.1117/12.2267775
Event: International Conference on Optoelectronics and Microelectronics Technology and Application, 2016, Shanghai, China
Abstract
The surface topography of micro-structures would significantly affect the products quality and industrial performance of micro-nano devices [1]. In recent years, the application of micro-structures in Micro Electro Mechanical Systems (MEMS) and integrated circuit is more and more widely. How to reflect the 3D surface topography of these micro structures accurately and measure the surface’s parameters precisely as well as quickly are becoming a hot research area of precision measurement. White-light interference microcopy technology is one of the most widely used non-contacting measurement methods at present, which has the advantages of nondestructive, fast measurement and high accuracy, has been widely applied in surface topography measurement of micro structures. In this paper, an analysis method of microstructure surface topography algorithm based on wavelet filter to analyze white interference signals is proposed, this method utilizes R/G/B three channels color information which is significantly superior to traditional black and white imaging process method. The experimental results shows that this method has good accuracy and repeatability in 3D surface measurement.
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Shu Zhang, Yushu Shi, Sitian Gao, Lei Pi, Qi Li, Wei Li, Zhendong Zhu, Shi Li, Lu Huang, Xin Guo, "Analysis method of microstructure surface topography based on wavelet filter", Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 102441H (5 January 2017); doi: 10.1117/12.2267775; https://doi.org/10.1117/12.2267775
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