5 January 2017 CMOS compatible thermal tunable planar silicon etched diffraction gratings
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Proceedings Volume 10244, International Conference on Optoelectronics and Microelectronics Technology and Application; 1024429 (2017) https://doi.org/10.1117/12.2266336
Event: International Conference on Optoelectronics and Microelectronics Technology and Application, 2016, Shanghai, China
Abstract
A five-channel silicon etched diffraction gratings (EDGs) working in the O-band was demonstrated in this paper. The device has a channel spacing of 20 nm and occupies a footprint of 180μm×120μm with an insertion loss of 5.3dB. Integrated heaters were designed to compensate the center wavelength shifts brought from fabrication errors. A tuning efficiency of 0.358nm/mA was obtained finally.
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Jun Li, Jun Li, Chao Qiu, Chao Qiu, Xin Chen, Xin Chen, Zhen Sheng, Zhen Sheng, Aimin Wu, Aimin Wu, Fuwan Gan, Fuwan Gan, } "CMOS compatible thermal tunable planar silicon etched diffraction gratings", Proc. SPIE 10244, International Conference on Optoelectronics and Microelectronics Technology and Application, 1024429 (5 January 2017); doi: 10.1117/12.2266336; https://doi.org/10.1117/12.2266336
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