7 June 2018 Co-integrating plasmonics with Si3N4 photonics towards a generic CMOS compatible PIC platform for high-sensitivity multi-channel biosensors: the H2020 PlasmoFab approach (Conference Presentation) (Withdrawal Notice)
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Abstract
Publisher’s Note: This conference presentation, originally published on 14 December 2017, was withdrawn per author request

Silicon photonics meet most fabrication requirements of standard CMOS process lines encompassing the photonics-electronics consolidation vision. Despite this remarkable progress, further miniaturization of PICs for common integration with electronics and for increasing PIC functional density is bounded by the inherent diffraction limit of light imposed by optical waveguides. Instead, Surface Plasmon Polariton (SPP) waveguides can guide light at sub-wavelength scales at the metal surface providing unique light-matter interaction properties, exploiting at the same time their metallic nature to naturally integrate with electronics in high-performance ASPICs.

In this article, we demonstrate the main goals of the recently introduced H2020 project PlasmoFab towards addressing the ever increasing needs for low energy, small size and high performance mass manufactured PICs by developing a revolutionary yet CMOS-compatible fabrication platform for seamless co-integration of plasmonics with photonic and supporting electronic. We demonstrate recent advances on the hosting SiN photonic hosting platform reporting on low-loss passive SiN waveguide and Grating Coupler circuits for both the TM and TE polarization states. We also present experimental results of plasmonic gold thin-film and hybrid slot waveguide configurations that can allow for high-sensitivity sensing, providing also the ongoing activities towards replacing gold with Cu, Al or TiN metal in order to yield the same functionality over a CMOS metallic structure. Finally, the first experimental results on the co-integrated SiN+plasmonic platform are demonstrated, concluding to an initial theoretical performance analysis of the CMOS plasmo-photonic biosensor that has the potential to allow for sensitivities beyond 150000nm/RIU.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dimitris M. Tsiokos, Dimitris M. Tsiokos, George Dabos, George Dabos, Dimitra Ketzaki, Dimitra Ketzaki, Jean-Claude Weeber, Jean-Claude Weeber, Laurent Markey, Laurent Markey, Alain Dereux, Alain Dereux, Anna Lena Giesecke, Anna Lena Giesecke, Caroline Porschatis, Caroline Porschatis, Bartos Chmielak, Bartos Chmielak, Thorsten Wahlbrink, Thorsten Wahlbrink, Karl Rochracher, Karl Rochracher, Nikos Pleros, Nikos Pleros, } "Co-integrating plasmonics with Si3N4 photonics towards a generic CMOS compatible PIC platform for high-sensitivity multi-channel biosensors: the H2020 PlasmoFab approach (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 10249, Integrated Photonics: Materials, Devices, and Applications IV, 1024902 (7 June 2018); doi: 10.1117/12.2268881; https://doi.org/10.1117/12.2268881
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