8 March 2017 Effect of substrate thickness on properties of protective antireflection a-C:H films deposited by PECVD
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Proceedings Volume 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016; 1025517 (2017) https://doi.org/10.1117/12.2266916
Event: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 2016, Jinhua, Suzhou, Chengdu, Xi'an, Wuxi, China
Abstract
The a-C:H films were deposited on glasses with different substrate thickness (rising from 2mm to 26mm) by Plasma Enhanced Chemical Vapor Deposition (PECVD). The effect of substrate thickness to the deposition rate, structural variations of films was investigated by surface morphology device and Raman spectroscopy. The results show that the deposition rate, H contents of films increase, meanwhile, I(D)/I(G), G peak position decrease and all of them show strong linear relation with the increasing substrate thickness. The a-C:H film with the highest thickness presents the highest deposition rate (37.7nm/s), nanohardness (20.2GPa), elastic modulus (118.8GPa) and lowest friction coefficient (0.266).
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Kaihu Fu, Chengkui Zu, Yangli Jin, Yang Qiu, Bin Han, "Effect of substrate thickness on properties of protective antireflection a-C:H films deposited by PECVD", Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 1025517 (8 March 2017); doi: 10.1117/12.2266916; https://doi.org/10.1117/12.2266916
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