8 March 2017 Effect of oxygen flux on stress and optical properties of Ta2O5 using ion-beam sputtering
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Proceedings Volume 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016; 102551E (2017) https://doi.org/10.1117/12.2267493
Event: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 2016, Jinhua, Suzhou, Chengdu, Xi'an, Wuxi, China
Abstract
The ion-beam sputtering deposition is a good technique for making low scattering coatings. In this work, the Ta2O5 thin films as the oxygen flux (15-35sccm) were prepared on the K9 glass using the single ion-beam sputtering. As the oxygen flux increased, the thickness of films with the same deposited time decreased from 936.67nm to 837.87nm. The refractive index was 2.075 in 1000nm at 30 sccm. The stress increased along with the increasing of oxygen flux. In the work, the compressive stress increased from 319.55 Mpa to 410.92 Mpa.
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Qi Yu, Qi Yu, Jun-qi Fan, Jun-qi Fan, Chun-lin Guan, Chun-lin Guan, } "Effect of oxygen flux on stress and optical properties of Ta2O5 using ion-beam sputtering", Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 102551E (8 March 2017); doi: 10.1117/12.2267493; https://doi.org/10.1117/12.2267493
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