8 March 2017 Measurement of high accuracy flatness using a commercial interferometer
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Proceedings Volume 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016; 102551H (2017) https://doi.org/10.1117/12.2268364
Event: Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 2016, Jinhua, Suzhou, Chengdu, Xi'an, Wuxi, China
Abstract
Higher accuracy of optical surface measurement is needed with the rapid development of optical industry and technology, especially in the field of optical manufacture and optical metrology. Fizeau interferometery is widely recognized as one of the most important measurement techniques currently in use. Results of the Fizeau interferometeric testing contain the reference surface errors and test surface errors. The test accuracy is restricted by the error of reference surface. As a result, so-called absolute flatness testing technology must be used to eliminate the system error such as reference surface error and higher accuracy of the surface profile testing. In this paper, the theory formula of even and odd functions is deduced, and the method are programmed for simulation. Based on HOOL phase-shifting interferometer, experiments are done to achieve high accuracy flatness measurement. The experiment shows that with high-accuracy interferometer, absolute flatness testing technology can effectively calibrate reference surface and improve the accuracy of flatness surface testing. An important result of this experiment is that the accuracy of the test surface can be reached λ/50.
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Yuchen Li, Yuchen Li, Xueyuan Li, Xueyuan Li, Quanzhao Wang, Quanzhao Wang, Sen Han, Sen Han, Shouhong Tang, Shouhong Tang, Quanying Wu, Quanying Wu, Linghua Zhang, Linghua Zhang, } "Measurement of high accuracy flatness using a commercial interferometer", Proc. SPIE 10255, Selected Papers of the Chinese Society for Optical Engineering Conferences held October and November 2016, 102551H (8 March 2017); doi: 10.1117/12.2268364; https://doi.org/10.1117/12.2268364
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