1 January 1992 Ion-beam deposition of fluoride thin films
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Proceedings Volume 10261, Infrared Thin Films: A Critical Review; 1026108 (1992) https://doi.org/10.1117/12.58692
Event: Critical Reviews, 1991, San Jose, CA, United States
Abstract
Ion beam-based thin film deposition processes are reviewed. Results illustrating some of the benefits of ion bombardment to fluoride coatings are presented. Fluoride coatings deposited using ion beam processes have higher packing density, lower stress, improved durability, and better adhesion.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ghanim A. Al-Jumaily, Ghanim A. Al-Jumaily, } "Ion-beam deposition of fluoride thin films", Proc. SPIE 10261, Infrared Thin Films: A Critical Review, 1026108 (1 January 1992); doi: 10.1117/12.58692; https://doi.org/10.1117/12.58692
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