PROCEEDINGS VOLUME 10273
13TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT | 22-24 SEPTEMBER 1993
64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review
Editor(s): Gregory K. Hearn
13TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT
22-24 September 1993
Santa Clara, CA, United States
64- to 256-Megabit Reticle Generation: Technology Requirements and Approaches (Critical Reviews)
Proc. SPIE 10273, Front Matter: Volume 10273, 1027301 (1 January 1994); doi: 10.1117/12.2285109
Proc. SPIE 10273, Lithography Roadmap: the role of the mask-making industry, 1027302 (1 January 1994); doi: 10.1117/12.177430
Proc. SPIE 10273, Circuit design: emphasis on mask design and specification, 1027303 (1 January 1994); doi: 10.1117/12.177436
Proc. SPIE 10273, Lithography error budget, 1027304 (1 January 1994); doi: 10.1117/12.177437
Proc. SPIE 10273, Wafer steppers for the 64-M and 256-Mbit memory generations, 1027305 (1 January 1994); doi: 10.1117/12.177438
Proc. SPIE 10273, Process engineering: overview of wafer fab process engineering dealing with equipment, processes, and control techniques to meet the SIA road map, 1027307 (1 January 1994); doi: 10.1117/12.177439
Proc. SPIE 10273, Reticle variation influence on manufacturing line and wafer device performance, 1027308 (1 January 1994); doi: 10.1117/12.177440
Proc. SPIE 10273, E-beam and optical reticle generation, 1027309 (1 January 1994); doi: 10.1117/12.177441
Proc. SPIE 10273, Reticle processing: overview of current and future reticle processing systems and system improvements that will enable the reticle manufacturer to meet future needs, 102730A (1 January 1994); doi: 10.1117/12.177442
Proc. SPIE 10273, Reticle metrology requirements: systems and methods, 102730B (1 January 1994); doi: 10.1117/12.177431
Proc. SPIE 10273, Reticle defect detection and repair, 102730C (1 January 1994); doi: 10.1117/12.177432
Proc. SPIE 10273, Cleaning and pelliclization, 102730D (1 January 1994); doi: 10.1117/12.177433
Proc. SPIE 10273, Mask quality assurance from a user's perspective, 102730E (1 January 1994); doi: 10.1117/12.177434
Proc. SPIE 10273, Technology development in the U.S. and Japan: the case of the phase-shifting mask, 102730F (1 January 1994); doi: 10.1117/12.177435
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