1 January 1994 Lithography Roadmap: the role of the mask-making industry
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Abstract
This paper sets a framework for those which follow. Specifically, the requirements of lithography and masks are detailed over a 15 year period and the exposure tool roadmap is reviewed. The various business stages in developing a lithography system, from concept to market success, are discussed and the need for earlier involvement of the mask making industry is identified.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gordon B. McMillan, "Lithography Roadmap: the role of the mask-making industry", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027302 (1 January 1994); doi: 10.1117/12.177430; https://doi.org/10.1117/12.177430
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