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1 January 1994 E-beam and optical reticle generation
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Abstract
An overview is provided of the technologies and architectures incorporated into commercial pattern generators as they apply to current and expected state-of-theart reticle requirements, and a fundamental assessment and comparison is made of the various approaches being used. The assessments are made with respect to pattern accuracy (pattern placement and feature size), data handling, and throughput; then projected over time in the light of key technical trends and requirements. While at any particular time the comparison of different machine architectures and technologies is heavily influenced by the effectiveness with which they are being implemented, from a fundamental perspective it is shown that raster scan systems have advantages in accuracy and data handling, and vector scan systems have an advantage in throughput. Based on projections of machine technical capabilities it is concluded that both architectures are capable of meeting reticle needs through and beyond the 256M generation of technologies, and that the major challenge is data handling. Most of the necessary performance improvements for all machines are expected to come from processing improvements and from data-path and printing strategy optimization (including multipass printing for error averaging) rather than only from printing-path architectural or hardware improvements.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Neil Berglund "E-beam and optical reticle generation", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 1027309 (1 January 1994); https://doi.org/10.1117/12.177441
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