Abstract
Reticles used in semiconductor lithography processes are required to be defect free. The meaning of the term "defect free" has evolved. This paper will provide a discussion on the evolution of this term and the defect inspection and repair equipment requirements for masks and reticles. A summary of current mask and reticle inspection and repair tools will also be provided.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rajeev R. Singh, Rajeev R. Singh, } "Reticle defect inspection and repair", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730C (1 January 1994); doi: 10.1117/12.177432; https://doi.org/10.1117/12.177432
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