Reticle defect detection and repair

Rajeev R. Singh

doi:10.1117/12.177432

1 January 1994 Reticle defect inspection and repair

Rajeev R. Singh

Proceedings Volume 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review; 102730C (1994) https://doi.org/10.1117/12.177432
Event: 13th Annual BACUS Symposium on Photomask Technology and Management, 1993, Santa Clara, CA, United States

Abstract

Reticles used in semiconductor lithography processes are required to be defect free. The meaning of the term "defect free" has evolved. This paper will provide a discussion on the evolution of this term and the defect inspection and repair equipment requirements for masks and reticles. A summary of current mask and reticle inspection and repair tools will also be provided.

Citation Download Citation

Rajeev R. Singh "Reticle defect inspection and repair", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730C (1 January 1994); https://doi.org/10.1117/12.177432

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