Translator Disclaimer
Paper
1 January 1994 Technology development in the U.S. and Japan: the case of the phase-shifting mask
Author Affiliations +
Abstract
The status of American competitiveness in high technology, and in particular the semiconductor industry, has been the subject of concern for some time now.1 With the rise of Japanese manufactures to preeminence in the manufacturing of DRAM (Dynamic Random Access Memory) chips during the 1980's, the fundamental assumptions of modern economic theory have been called into question.2 Various factors have been cited by various authors to account for the recent rise in Japanese competitiveness, including industrial policies of the Japanese government, differences in the cost of capital, investments in research and development, and the requirement of American companies to post financial results quarterly.3 There is, however, a real need for concrete case studies, which can examine the actual history of a technology and establish mechanisms of cause and effect.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank Schellenberg, Dan Okimoto, Jim Raphael, and Norihiko Shirouzu "Technology development in the U.S. and Japan: the case of the phase-shifting mask", Proc. SPIE 10273, 64-to 256-Megabit Reticle Generation: Technology Requirements and Approaches: A Critical Review, 102730F (1 January 1994); https://doi.org/10.1117/12.177435
PROCEEDINGS
39 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Reparing the mask industry
Proceedings of SPIE (October 20 2006)
Panel discussion summary do we need a revolution in...
Proceedings of SPIE (July 12 2002)
Photomasks today and tomorrow
Proceedings of SPIE (July 03 1995)
Mask industry assessment: 2004
Proceedings of SPIE (December 06 2004)
Defect printability in CPL mask technology
Proceedings of SPIE (May 28 2004)

Back to Top