Scanning electron microscope metrology

Michael T. Postek Jr.

doi:10.1117/12.187461

1 July 1994 Scanning electron microscope metrology

Michael T. Postek Jr.

Proceedings Volume 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review; 1027405 (1994) https://doi.org/10.1117/12.187461
Event: Microelectronic Processing '93, 1993, Monterey, CA, United States

Abstract

During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of precision. Optical microscopy, scanning electron microscopy and the various forms of scanning probe microscopies are major microscopical techniques used for submicrometer metrology. New techniques applied to scanning electron microscopy have improved some of the limitations of this technique and time will permit even further improvements. This presentation will review the current state of scanning electron microscope (SEM) metrology in light of many of these recent improvements.

Citation Download Citation

Michael T. Postek Jr. "Scanning electron microscope metrology", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027405 (1 July 1994); https://doi.org/10.1117/12.187461

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