1 July 1994 Accuracy in integrated circuit dimensional measurements
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Abstract
The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Potzick, "Accuracy in integrated circuit dimensional measurements", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027409 (1 July 1994); doi: 10.1117/12.187463; https://doi.org/10.1117/12.187463
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