1 July 1994 Accuracy in integrated circuit dimensional measurements
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Abstract
The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James Potzick, James Potzick, } "Accuracy in integrated circuit dimensional measurements", Proc. SPIE 10274, Handbook of Critical Dimension Metrology and Process Control: A Critical Review, 1027409 (1 July 1994); doi: 10.1117/12.187463; https://doi.org/10.1117/12.187463
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