Paper
30 January 1996 Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography
Paul D. Maker, Daniel W. Wilson, Richard E. Muller
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Abstract
Free space optical interconnect phase holograms fabricated in poly-methyl methacrylate films by direct-write electron beam lithography have been characterized both physically and optically. Performance of holograms containing common fabrication errors is simulated using both Fourier optics and, for a simple one dimensional hologram, a numerical solution of the Helmholtz equation. The degradation of optical performance due to measured fabrication errors and design errors is discussed in view of the simulation results.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul D. Maker, Daniel W. Wilson, and Richard E. Muller "Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography", Proc. SPIE 10284, Optoelectronic Interconnects and Packaging: A Critical Review, 102840O (30 January 1996); https://doi.org/10.1117/12.229275
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CITATIONS
Cited by 18 scholarly publications and 1 patent.
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KEYWORDS
Holograms

Lithography

Computer simulations

Device simulation

Electron beam lithography

Fourier optics

Free space

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