30 January 1996 Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography
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Abstract
Free space optical interconnect phase holograms fabricated in poly-methyl methacrylate films by direct-write electron beam lithography have been characterized both physically and optically. Performance of holograms containing common fabrication errors is simulated using both Fourier optics and, for a simple one dimensional hologram, a numerical solution of the Helmholtz equation. The degradation of optical performance due to measured fabrication errors and design errors is discussed in view of the simulation results.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul D. Maker, Paul D. Maker, Daniel W. Wilson, Daniel W. Wilson, Richard E. Muller, Richard E. Muller, } "Fabrication and performance of optical-interconnect analog-phase holograms made by electron-beam lithography", Proc. SPIE 10284, Optoelectronic Interconnects and Packaging: A Critical Review, 102840O (30 January 1996); doi: 10.1117/12.229275; https://doi.org/10.1117/12.229275
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