28 July 1997 Optics applications of chemical vapor deposited beta-SiC
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The fabrication process, properties and optics applications of transparent and opaque chemical vapor deposited (CVD) (3-SiC are reviewed. CVD-SiC is produced by the pyrolysis of methyltrichlorosilane, in excess H2, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter upto 1.5-m and thickness 2.5-cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicates that it is a superior material for optics applications. Important properties of CVD-SiC are compared with those of the other candidate mirror and window materials. The applications of CVDSiC for lightweight optics, x-ray telescopes, optical baffles, lens molds, optical standards and windows and domes are discussed in detail.
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Jitendra S. Goela, Jitendra S. Goela, Michael A. Pickering, Michael A. Pickering, } "Optics applications of chemical vapor deposited beta-SiC", Proc. SPIE 10289, Advanced Materials for Optics and Precision Structures: A Critical Review, 1028908 (28 July 1997); doi: 10.1117/12.279816; https://doi.org/10.1117/12.279816


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