The fabrication process, properties and optics applications of transparent and opaque chemical vapor deposited (CVD) (3-SiC are reviewed. CVD-SiC is produced by the pyrolysis of methyltrichlorosilane, in excess H2, in a low-pressure CVD reactor. The CVD process has been successfully scaled to produce monolithic SiC parts of diameter upto 1.5-m and thickness 2.5-cm. The characterization of CVD-SiC for important physical, optical, mechanical and thermal properties indicates that it is a superior material for optics applications. Important properties of CVD-SiC are compared with those of the other candidate mirror and window materials. The applications of CVDSiC for lightweight optics, x-ray telescopes, optical baffles, lens molds, optical standards and windows and domes are discussed in detail.