28 March 1990 Plasma-enhanced CVD Of W and Mo oxides
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Proceedings Volume 10304, Large-Area Chromogenics: Materials and Devices for Transmittance Control; 103040D (1990) https://doi.org/10.1117/12.2283616
Event: Institutes for Advanced Optical Technologies, 1989, Hamburg, Germany
Recently a new technique for making electrochromic coatings has been presented. In the semiconductor industry, plasma enhanced chemical vapor deposition (PE-CVD) is routinely used to produce oxide and nitride coatings and photovoltaic a-Si devices . At the Solar Energy Research Institute the technique has now been developed to produce electrochromic coatings of tungsten and molybdenum oxidel-4 .The results are very promising and coatings show the same characteristics as tungsten and molybdenum oxides produced by evaporation. The main difference is that the coatings are produced at a much higher rate using PE-CVD. Deposition rates greater than 40 nm/s have been achieved for tungsten oxide. This points at the possibility to produce electrochromic devices at a more competitive price than with competing technologies.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
D. K. Benson, D. K. Benson, } "Plasma-enhanced CVD Of W and Mo oxides", Proc. SPIE 10304, Large-Area Chromogenics: Materials and Devices for Transmittance Control, 103040D (28 March 1990); doi: 10.1117/12.2283616; https://doi.org/10.1117/12.2283616

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