28 March 1990 Large area/high rate sputtering of materials for electro-chromic devices
Author Affiliations +
Proceedings Volume 10304, Large-Area Chromogenics: Materials and Devices for Transmittance Control; 103040G (1990) https://doi.org/10.1117/12.2283619
Event: Institutes for Advanced Optical Technologies, 1989, Hamburg, Germany
Abstract
The preparation of any large area system is going to require a deposition system for the thin film elements of the device which not only have the properties required but also can be made in the large areas, and for the low cost, that will be needed for any device which is to have any large-scale applicability. Techniques for the large-scale production of multi-layer optical filters for use in windows for buildings and cars have appeared over the last few years, and it has been demonstrated' that planer magnetron sputtering can give the large area uniformity, low cost and high rate required for such a system. Part of this process includes the reactive deposition of an oxide. The properties of this oxide are not critical, but research is proceeding into the techniques that need to be used to manufacture oxides with much better control of their properties while maintaining the advantages of large area availability and low cost.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. P. Howson, R. P. Howson, } "Large area/high rate sputtering of materials for electro-chromic devices", Proc. SPIE 10304, Large-Area Chromogenics: Materials and Devices for Transmittance Control, 103040G (28 March 1990); doi: 10.1117/12.2283619; https://doi.org/10.1117/12.2283619
PROCEEDINGS
11 PAGES


SHARE
Back to Top