29 August 2017 Novel ion implantation based method for surface patterning
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Proceedings Volume 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging; 1031315 (2017) https://doi.org/10.1117/12.2283837
Event: Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 2002, Ottawa, Ontario, Canada
Abstract
Recently, there has been much attention focused on photonic crystals and photonic bandgap materials [1]. The fabrication of these materials requires the formation of a periodic variation in the refractive index on a submicrometer length scale. It is anticipated that these structures will provide the building blocks required for future photonic devices and photonic integrated circuits. Applications are envisaged for structures with both 2- and 3-dimensional periodicity. In this communication we report results from a novel variant of ion beam lithography. The approach involves ion implantation through a mask of silica microspheres, followed by selective chemical etching.
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Chris P. McNorgan, Chris P. McNorgan, } "Novel ion implantation based method for surface patterning", Proc. SPIE 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 1031315 (29 August 2017); doi: 10.1117/12.2283837; https://doi.org/10.1117/12.2283837
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