29 August 2017 Plasma-deposited inhomogeneous optical filters
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Proceedings Volume 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging; 103134S (2017) https://doi.org/10.1117/12.2283968
Event: Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 2002, Ottawa, Ontario, Canada
Abstract
Plasma-enhanced chemical vapor deposition was used to deposit titanium dioxide (TiO2), silicon dioxide (SiO2) and Ti02/Si02 mixtures films with any index of refraction between 1.50 for SiO, and 2.35 for TiO2. We fabricated simple inhomogeneous and multilayer filters, namely rugate filters and quarter-wave stacks, as well as more sophisticated inhomogeneous filters, multiband rugate filters. We showed that inhomogeneous filters cause less light scattering than their multilayer counterparts.
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Stephane Larouche, Stephane Larouche, } "Plasma-deposited inhomogeneous optical filters", Proc. SPIE 10313, Opto-Canada: SPIE Regional Meeting on Optoelectronics, Photonics, and Imaging, 103134S (29 August 2017); doi: 10.1117/12.2283968; https://doi.org/10.1117/12.2283968
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