19 May 2003 Metrology challenges of thin optical wafers for high finesse etalons
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Abstract
We present a number of measurement methods that we use in the fabrication of solid LiNbO3 etalons. Several unique technical features, such as high finesse, large aperture/high aspect ratio, and tunability, require careful monitoring of quality parameters throughout the production process. We point out the critical issues and how we monitor them.
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Jan Burke, "Metrology challenges of thin optical wafers for high finesse etalons", Proc. SPIE 10314, Optifab 2003: Technical Digest, 1031414 (19 May 2003); doi: 10.1117/12.2284029; https://doi.org/10.1117/12.2284029
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