19 May 2003 Progress of modern interference layer design methods and coating technologies demonstrated by the manufacturing of uncemented, wide-angle thin film polarizers
Author Affiliations +
Abstract
The progress of modern interference layer design methods and coating technologies is demonstrated by the manufacturing of uncemented, wide-angle thin film polarizers. The requirements are to produce uncemented polarizers for 655nm and an angle of incidence of i=45° +/-6°. The dimensions are 9,5 x 8 [mm] and the surface flatness should be less than 2J15. The items should be manufactured in huge numbers to reasonable costs. The multilayer system was developed by modem design methods. The realisation of such complex design needs very stable properties of the coatings and a sophisticated monitoring system. For this purpose an ion-assisted coating technology was applied. The resulting coatings are shiftfree and mechanically resistant, which is important for the following cutting process. The cutting of large substrates into the required dimension allows the manufacturing of demanding elements to comparatively low costs. Special methods for mechanical stress compensation of the coating system were used to fulfil the demands on the surface flatness.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gottfried Wurlitzer, "Progress of modern interference layer design methods and coating technologies demonstrated by the manufacturing of uncemented, wide-angle thin film polarizers", Proc. SPIE 10314, Optifab 2003: Technical Digest, 103141K (19 May 2003); doi: 10.1117/12.2284045; https://doi.org/10.1117/12.2284045
PROCEEDINGS
2 PAGES


SHARE
Back to Top