Future lithography technology

Gene Fuller

doi:10.1117/12.2284078

30 August 2017 Future lithography technology

Gene Fuller

Proceedings Volume 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition; 1032005 (2017) https://doi.org/10.1117/12.2284078
Event: Tutorial Texts in Optical Engineering Series 1991, 1991, Bellingham, WA, United States

Abstract

Introduction-Lithography is the key enabler for semiconductor manufacturing. Future Progress in circuit scaling depends on contrinued progress in lithography capability scaling. Lithograph is once again approaching a "barrier" where exisiting technology does not demonstrate a clear path for continued progress. We will explore some continuities and discontinuities in lithography that promise to drive the scaling process for many years.

Citation Download Citation

Gene Fuller "Future lithography technology", Proc. SPIE 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition, 1032005 (30 August 2017); https://doi.org/10.1117/12.2284078

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