30 August 2017 Future lithography technology
Author Affiliations +
Proceedings Volume 10321, Single Frequency Semiconductor Lasers; 1032105 (2017) https://doi.org/10.1117/12.2284084
Event: Tutorial Texts in Optical Engineering Series 1991, 1991, Bellingham, WA, United States
Introduction-Lithography is the key enabler for semiconductor manufacturing. Future progress in circuit scaling depends on continued progress in lithography capability scaling. Lithography is once again approaching a "barrier" where existing technology does not demonstrate a clear path for continued progress. We will explore some continuities and discontinuities in lithography that promise to drive the scaling process for many years
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gene Fuller, Gene Fuller, } "Future lithography technology", Proc. SPIE 10321, Single Frequency Semiconductor Lasers, 1032105 (30 August 2017); doi: 10.1117/12.2284084; https://doi.org/10.1117/12.2284084

Back to Top