13 July 2017 Front Matter: Volume 10330
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10330 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

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Author(s), “Title of Paper,” in Modeling Aspects in Optical Metrology VI, edited by Bernd Bodermann, Karsten Frenner, Richard M. Silver, Proceedings of SPIE Vol. 10330 (SPIE, Bellingham, WA, 2017) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510611054

ISBN: 9781510611061

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Abbasi, Shabnam, 1N

Abregana, Timothy Joseph T., 0G

Aguirre Aguirre, Daniel, 1V

Alexe, Gabriela, 0K

Almoro, Percival F., 0G

Arasa, J., 18

Armengol-Cruz, Victor de Emanuel, 0Q, 1V

Baghdasaryan, D. A., 1X

Bakholdin, A. V., 1D

Barnes, Bryan M., 0W

Baselt, Tobias, 0E

Bauer, J., 17

Bischoff, Jörg, 0N

Blanco, P., 18

Bodermann, Bernd, 04

Bointon, Patrick, 06

Boriskin, A. G., 1M

Burger, Sven, 04

Campos-García, Manuel, 0Q, 0R, 1E, 1V

Castán-Ricaño, Diana, 1W

Castilla, P., 18

Chen, Shanyong, 1G

Chen, Shuxiao, 06

Chen, Tong, 0H

Chirkov, M. A., 09

Cornejo-Rodríguez, A., 1W

Cossio-Guerrero, Cesar, 0Q, 1E

Csonti, K., 15

Díaz-Uribe, José Rufino, 0R

Dickmann, Johannes, 0S

Dneprovskii, V. S., 1M

Domínguez, N., 18

Donazzan, Alberto, 0F

Du, Shaojun, 1S, 1T

Dubrov, Alexander V., 1K

Dubrov, Vladimir D., 1K

Duma, Maria-Alexandra, 14

Duma, Virgil-Florin, 14

Espínola, M., 18

Fernández Herrero, A., 0U

Fischer, Andreas, 0K

Freijo Martín, Idoia, 07

Frenner, Karsten, 0Y

Fu, Liwei, 0Y

Fursenko, O., 17

Garcia Santiago, Xavier, 04

García, C., 18

Gharibzadeh, Azadeh, 1N

Głomb, Grzegorz, 19

Granados-Agustín, Fermín S., 1W

Gritsevich, Maria, 0A

Guan, Chaoliang, 1G

Hæggström, Edward, 0A

Hammerschmidt, Martin, 04

Hansen, P.-E., 0J

Hanyecz, V., 15

Hartmann, Peter, 0E

Hassim, M. A. A., 1R

Helander, Petteri, 0A

Henn, Mark-Alexander, 0W

Hermosa, Nathaniel P., 0G

Heusinger, Martin, 0S

Horák, Martin, 16

Hou, Xi, 0P

Jensen, S. A., 0J

Jirásek, Milan, 16

Kania, Dariusz, 1Z, 20

Karamehmedovic, M., 0J

Kassamakov, Ivan, 0A

Khor, Wei Ying, 1F

Korotaev, Valery V., 1H

Kovács, A. P., 15

Kozacki, T., 0D

Kraszewski, Maciej, 02

Krizskiy, Pavel, 1P

Kroker, Stefanie, 0S

Kukushkin, D. E., 1D

Kulmon, Pavel, 16, 1B

Kurzynowski, Piotr, 0X

Lai, Tao, 1G

Lasagni, Andrés Fabián, 0E

Lashmanov, Oleg U., 1H

Latifi, Hamid, 0I

Leach, Richard, 06

Lecler, Sylvain, 0V

Leong-Hoi, Audrey, 0V

Li, Dong, 0H

Li, Huiyu, 0Y

Liao, Quan, 1G

Likhachev, Dmitriy V., 0B, 1J

Lim, Hwee San, 1F

Liu, Junfeng, 1G

Lukosius, M., 17

Luo, Ruirao, 1S

Lupina, G., 17

Maconi, Göran, 0A

Madanipour, Khosro, 1L, 1N

Madsen, J. S., 0J

Madsen, M. H., 0J

Mai, A., 17

Manske, Eberhard, 0N

Martinez-Carranza, J., 0D

Masajada, Jan, 0X

Mastylo, Rostyslav, 0N

Mat Jafri, Mohamad Zubir, 1F, 1R

Mészáros, G., 15

Mikš, Antonín, 16, 1B

Mirzade, Fikret Kh., 1C, 1K

Montgomery, Paul C., 0V

Mroczka, Janusz, 1A

Muinonen, Karri, 0A

Muzychenko, Yana B., 1O

Naletto, Giampiero, 0F

Nelsen, Bryan, 0E

Ning, Yu, 1S

Novák, Jiří, 16, 1B

Novák, Pavel, 16, 1B

Nowocień, Sylwester, 1A

Oraie, Mohammadreza, 0I

Osorio-Infante, Arturo I., 1E

Osten, Wolfgang, 0Y

Pak, Alexey, 0O

Pelizzo, Maria G., 0F

Peña-Conzuelo, Andrés, 0R

Penttilä, Antti, 0A

Percino-Zacarías, E., 1W

Perrin, Stephane, 0V

Pflüger, M., 0U

Piano, Samanta, 06

Pizarro, C., 18

Pluciński, Jerzy, 02

Pokorný, Petr, 16, 1B

Popiołek-Masajada, Agnieszka, 0X

Puranen, Tuomas, 0A

Quan, Haiyang, 0P

Rojas Hurtado, Carol B., 0S

Ryzhova, Victoria A., 13

Sazonenko, D. A., 1D

Scholze, F., 0U

Shojaie, Ehsan, 1L, 1N

Siefke, Thomas, 0S

Silver, Richard M., 0W

Sims-Waterhouse, Danny, 06

Sinn, Harald, 07

Šmejkal, Filip, 16, 1B

Smirnov, A. M., 1M

Sohn, Martin Y., 0W

Soltwisch, V., 0U

Song, Weihong, 0P

Southon, Nicholas, 06

Stavroulakis, Petros I., 06

Stepien, P., 0D

Stöbener, Dirk, 0K

Sun, Quan, 1S, 1T

Świrniak, Grzegorz, 19

Sycheva, Elena A., 1H

Tajaldini, M., 1R

Taudt, Christopher, 0E

Tausendfreund, Andreas, 0K

Tian, Jindong, 0H

Tian, Yong, 0H

Tie, Guipeng, 1G

Topalov, Oleg K., 1O

Trushkina, Anna V., 13

Tsyganok, E. A., 09

Valyavin, G. G., 1D

Vannoni, Maurizio, 07

Vasilev, Aleksandr S., 13, 1H

Vasilyev, V. N., 1D

Villringer, C., 17

Voznesenskaya, Anna, 1P

Weiser, Martin, 04

Wu, Fan, 0P

Wu, Jianmei, 0H

Wu, Wuming, 1S

Yang, Yi, 1S, 1T

Zavalov, Yuri N., 1K

Zhang, Xuanzhe, 1T

Zhou, Hui, 0W

Zhou, Qiong, 1T

Zinchik, Alexander A., 1O

Zschiedrich, Lin, 04

Conference Committee

Symposium Chair

  • Wolfgang Osten, Universität Stuttgart (Germany)

Conference Chair

  • Bernd Bodermann, Physikalisch-Technische Bundesanstalt (Germany)

Conference Co-chairs

  • Karsten Frenner, Institut für Technische Optik (Germany)

  • Richard M. Silver, National Institute of Standards and Technology (United States)

Conference Program Committee

  • Markus Bär, Physikalisch-Technische Bundesanstalt (Germany)

  • Jörg Bischoff, Osires Optical Engineering (Germany)

  • Harald Bosse, Physikalisch-Technische Bundesanstalt (Germany)

  • Sven Burger, Konrad-Zuse-Zentrum für Informationstechnik (Germany)

  • Peter Evanschitzky, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

  • Christian Hafner, ETH Zurich (Switzerland)

  • Wolfgang Holzapfel, Dr. Johannes Heidenhain GmbH (Germany)

  • Bernd H. Kleemann, Carl Zeiss AG (Germany)

  • Wolfgang Osten, Institut für Technische Optik (Germany)

  • Andreas Rathsfeld, Weierstrass-Institut für Angewandte Analysis und Stochastik (Germany)

  • Thomas Scherübl, Carl Zeiss SMS GmbH (Germany)

  • Patrick Schiavone, Aselta Nanographics (France)

  • Irwan D. Setija, ASML Netherlands B.V. (Netherlands)

  • Michael Totzeck, Carl Zeiss AG (Germany)

  • Jari Turunen, University of Eastern Finland (Finland)

  • Frank Wyrowski, Friedrich-Schiller-Universität Jena (Germany)

Session Chairs

  • 1 Light Scattering

    Stefanie Kroker, Physikalisch-Technische Bundesanstalt (Germany)

  • 2 Optical Systems

    Wolfgang Osten Universität Stuttgart (Germany)

  • 3 Mueller Polarimetry

    Poul-Erik Hansen, Danish Fundamental Metrology (Denmark)

  • 4 Interferometry and Phase I

    Karsten Frenner, Institut für Technische Optik (Germany)

  • 5 Interferometry and Phase II

    Daniel Claus, Universität Stuttgart (Germany)

  • 6 Scatterometry

    Jörg Bischoff, Technische Universität Ilmenau (Germany)

  • 7 Surface Topography and Form

    Richard M. Silver, National Institute of Standards and Technology (United States)

  • 8 Gratings: LER and Polarisation

    Martin Hammerschmidt, Konrad-Zuse-Zentrum für Informationstechnik Germany)

  • 9 Microscopy and Imaging

    Bernd Bodermann, Physikalisch-Technische Bundesanstalt (Germany)

JS SPIE/OM/EQEC: Light and Structure

Timothy D. Drysdale, The Open University (United Kingdom)

Introduction

The conference Modeling Aspects in Optical Metrology VI is organised as part of SPIE Optical Metrology Symposium, which is co-located with World of Photonics Congress 2017 in Munich, Germany. This conference is dedicated to establishling a forum to present and discuss the basic methods, techniques, and algorithms that are necessary for a proper modelling and simulation of applied optical metrology techniques. Special emphasis is placed on the description and modelling of new methods, algorithms, components or complete measurement systems.

Optical metrology methods are, in general, fast, non-destructive, reliable, flexible, and can nevertheless reach a high level of sensitivity. Therefore, their use in industrial applications such as process development or production control is continuously increasing. Concurrently, the metrological requirements are soaring rapidly, leading to a strong demand for both methodical extensions and improved metrology methods.

It is of utmost importance to fully understand the optical measurement process in order to exploit the full potential of optical metrology. This requires the ability of quantitatively predicting the dependence of the output of an optical sensor or measurement system on certain variations of the measurement object, the sensor itself, or the measurement environment. Only if these influences on the measurement result are well understood and appropriately considered in a suitable model of the measurement process, the measurement result and its associated measurement uncertainty can be used, for example, for reliable control of production processes. This in-depth understanding usually requires—or is at least strongly supported by—a reliable modelling or simulation of the optical measurement process. In this sense, modelling is a prerequisite for traceable and comparable measurements. This is particularly essential for recent and novel approaches in optical nanoscopy to bridge the gap between super-resolution imaging and real metrological applications.

Important topics are the development and verification of methods to describe the interaction of light with matter for quantitative characterization of micro- and nanostructures or the high accuracy description of light propagation in optical systems. Relevant applications range from optical metrology and inspection of nanostructures on masks and wafers in the semiconductor industry, display production, advanced photovoltaics, the investigation of grating structures and grating-based devices, the metrology of surfaces and layers to characterisation of complex optical systems. In many applications, nanometer or sub-nanometer measurement uncertainties are required. New and very interesting fields of application will arise in the physical and dimensional characterisation and the theoretical description of new and effective optical materials like photonic crystals or metamaterials. In combination with a better understanding and exploitation of novel nano-photonics and plasmonics, these developments will in the future enable a variety of novel optical components, systems and metrology systems with enhanced performance.

I would like to thank all contributors, participants, SPIE staff, the members of the program committee and the co-chairs for their support and for turning this conference into a success.

Bernd Bodermann

Karsten Frenner

Richard M. Silver

© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
} "Front Matter: Volume 10330", Proc. SPIE 10330, Modeling Aspects in Optical Metrology VI, 1033001 (13 July 2017); doi: 10.1117/12.2282906; https://doi.org/10.1117/12.2282906
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