This optical metrology technique with combined data collection exhibit a fast and highly precise method allowing one an unambiguous detection of graphene after transferring as well as after the CVD deposition process on a Ge(100)/Si(100) wafer. This approach is well suited for industrial applications due to its repeatability and flexibility. |
ACCESS THE FULL ARTICLE
No SPIE Account? Create one
CITATIONS
Cited by 2 scholarly publications.
Graphene
Semiconducting wafers
Process control
Chemical vapor deposition
Optical metrology
Optical spectroscopy
Microelectronics