1 August 2017 Highly transparent VO2-SiO2 films with excellent infrared characteristics by dual-target magnetron sputtering
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Proceedings Volume 10339, Pacific Rim Laser Damage 2017: Optical Materials for High-Power Lasers; 103391I (2017) https://doi.org/10.1117/12.2268873
Event: Pacific Rim Laser Damage 2017: Optical Materials for High Power Lasers, 2017, Shanghai, China
Abstract
With the aim to fabricate high quality and boosting the optical performance of vanadium dioxide (VO2) film, basing on effective medium theory, dual-target magnetron sputtering method is first introduced into VO2-SiO2 composite film on quartz by changing the flow ratio of Argon and oxygen. X-Ray diffraction measurement indicates the purity of the composite film. Atomic force microscopy measurement shows that the minimum grain size is about 45nm. Infrared (IR) switching characteristic is well demonstrated by a double-frequented He-Ne laser at the wavelength of 3mμ,compare to VO2 film obtained at the same sputtering time, the result reveals that the composite film exhibit excellent IR switching property, furthermore, multi-wavelength tests and calculations show that all of the obtained composite films exhibit high integrate luminous transmittance of 50%, and the transmittance in semiconducting phase of one thin film is 65% and decreases to 24% in metallic phase at the wavelength of 2mμ , with the switching efficiency of 63%. High visible transmittance and excellent infrared switching characteristics make the film an appropriate candidate for laser protection as well as smart windows.
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Qing Cheng, Da Su, Yaqin Wang, Ying Huang, "Highly transparent VO2-SiO2 films with excellent infrared characteristics by dual-target magnetron sputtering", Proc. SPIE 10339, Pacific Rim Laser Damage 2017: Optical Materials for High-Power Lasers, 103391I (1 August 2017); doi: 10.1117/12.2268873; https://doi.org/10.1117/12.2268873
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