Electrostatic microcolumns for surface plasmon enhanced electron beamlets

Zhidong Du; Chen Chen; Liang Pan

doi:10.1117/12.2273492

25 August 2017 Electrostatic microcolumns for surface plasmon enhanced electron beamlets

Zhidong Du, Chen Chen, Liang Pan

Proceedings Volume 10346, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XV; 1034608 (2017) https://doi.org/10.1117/12.2273492
Event: SPIE Nanoscience + Engineering, 2017, San Diego, California, United States

Abstract

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of a large array of electrostatic microcolumns for our recent surface plasmon enhanced photoemission sources is optimized numerically. Because of the compactness, one million of microcolumns can be put within 1 cm² area. To avoid the trade-off between resolution and throughput, each microcolumn has one beamlet and there is no crossing point between any of the beamlets. An aperture self-aligned fabrication process is developed to make the optimized microcolumns.

Conference Presentation

Citation Download Citation

Zhidong Du, Chen Chen, and Liang Pan "Electrostatic microcolumns for surface plasmon enhanced electron beamlets", Proc. SPIE 10346, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XV, 1034608 (25 August 2017); https://doi.org/10.1117/12.2273492

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