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25 August 2017 Side lobe suppression in phase mask-based nonlinear superresolution microscopy
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We compare side lobe suppression methods for nonlinear superresolution optical microscopy using phase masked excitation beams. The excitation point spread function (PSF) can be engineered by introducing a phase mask for superresolution microscopy. By applying a single π phase step to the excitation the central spot can be narrowed and provide improved lateral resolution. However, the energy redistribution leads to side lobes with increased intensity that complicates imaging applications. Several methods have been implemented to suppress the strength of the side lobes including confocal detection and utilizing beams with different phase masks in multiphoton microscopy. Side lobe suppression methods using confocal detection and different phase masks for the excitation beams are compared theoretically and experimentally. These results demonstrate the additional flexibility for PSF engineering for nonlinear optical processes.
© (2017) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryan Beams and Stephan J. Stranick "Side lobe suppression in phase mask-based nonlinear superresolution microscopy", Proc. SPIE 10350, Nanoimaging and Nanospectroscopy V, 1035009 (25 August 2017);

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