31 August 2017 Innovative patterning method for modifying few-layer MoS2 device geometries
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Abstract
When mechanically exfoliated two-dimensional (2D) materials are used for device applications, their properties strongly depend on the geometry and number of layers present in the flake. In general, these properties cannot be modified once a device has been fabricated out of an exfoliated flake. In this work we present a novel nano-patterning method for 2D material based devices, Pulsed eBeam Gas Assisted Patterning (PEBGAP), that allows us to fine tune their geometry once the device fabrication steps have been completed.
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Fernando Jiménez Urbanos, Fernando Jiménez Urbanos, Andrés Black, Andrés Black, Ramón Bernardo-Gavito, Ramón Bernardo-Gavito, Manuel R. Osorio, Manuel R. Osorio, Santiago Casado, Santiago Casado, Daniel Granados, Daniel Granados, } "Innovative patterning method for modifying few-layer MoS2 device geometries", Proc. SPIE 10354, Nanoengineering: Fabrication, Properties, Optics, and Devices XIV, 103540G (31 August 2017); doi: 10.1117/12.2272702; https://doi.org/10.1117/12.2272702
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