Optical elements for polarization control are one of the main parts in advanced laser systems. The state and intensity of polarized light is typically controlled by optical elements, namely waveplates. Polymers, solid or liquid crystals and other materials with anisotropic refractive index can be used for production of waveplates. Unfortunately, most of aforementioned materials are fragile, unstable when environmental conditions changes, difficult to apply in microsystems and has low resistance to laser radiation. Retarders, fabricated by evaporation process, do not consist any of these drawbacks. In order to manufacture such optical components with high quality, characterisation of deposition parameters are essential. A serial bi-deposition method was employed to coat anisotropic layers for polarisation control. Such waveplate can be deposited on micro optics or other optical elements, essentially improving compact optical systems. The range of available materials is limited by absorption losses for waveplates in UV spectral region. Therefore, the investigation was accomplished with four eligible candidates – TiO2, LaF3, Al2O3 and SiO2. Structural (XPS, XRD) and optical (spectrophotometry, ellipsometry) analysis have shown Al2O3 and SiO2 as the most applicable materials for UV spectral region.