23 August 2017 Large area of MCP electronic rinse system design
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Abstract
Based on the study of the current technology of MCP electron rinse and parameters testing, a new electron rinse and testing system with four working stations for large area MCP is developed. In this system, electron rinse for various large area MCP of diameter less than 100mm can be conducted on each station at the same time, and parameters could be tested at one of the stations in the process of the electron rinse at different stages. Four stations in the vacuum system can be converted to each other quickly and accurately by operating the mechanical transmission structure designed. The system's superior performance was shown by a series of tests and data.
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Yafeng Qiu, Yafeng Qiu, Zhigang Yan, Zhigang Yan, Chengxin Song, Chengxin Song, } "Large area of MCP electronic rinse system design", Proc. SPIE 10371, Optomechanical Engineering 2017, 103710X (23 August 2017); doi: 10.1117/12.2272228; https://doi.org/10.1117/12.2272228
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